Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9171934 | Methods of forming semiconductor devices using a layer of material having a plurality of trenches formed therein | Ruilong Xie, Ryan Ryoung-Han Kim | 2015-10-27 |
| 9153694 | Methods of forming contact structures on finfet semiconductor devices and the resulting devices | Ruilong Xie, Ryan Ryoung-Han Kim | 2015-10-06 |
| 9117930 | Methods of forming stressed fin channel structures for FinFET semiconductor devices | Vimal Kamineni, Derya Deniz, Abner Bello, Abhijeet Paul, Robert J. Miller | 2015-08-25 |
| 8962413 | Methods of forming spacers on FinFETs and other semiconductor devices | Xiuyu Cai, Ruilong Xie | 2015-02-24 |
| 8900941 | Methods of forming spacers on FinFETs and other semiconductor devices | Xiuyu Cai, Ruilong Xie | 2014-12-02 |
| 8889500 | Methods of forming stressed fin channel structures for FinFET semiconductor devices | Vimal Kamineni, Derya Deniz, Abner Bello, Abhijeet Paul, Robert J. Miller | 2014-11-18 |
| 8877588 | Methods of forming a three-dimensional semiconductor device with a dual stress channel and the resulting device | Daniel T. Pham, Werner Juengling, Robert J. Miller | 2014-11-04 |
| 8728885 | Methods of forming a three-dimensional semiconductor device with a nanowire channel structure | Daniel T. Pham, Jody A. Fronheiser | 2014-05-20 |
| 8664093 | Methods of forming a silicon seed layer and layers of silicon and silicon-containing material therefrom | Daniel T. Pham | 2014-03-04 |
| 7910442 | Process for making a semiconductor device using partial etching | Cristiano Capasso, Srikanth B. Samavedam, James K. Schaeffer | 2011-03-22 |
| 7709331 | Dual gate oxide device integration | Gauri Karve, Srikanth B. Samavedam | 2010-05-04 |
| 7666730 | Method for forming a dual metal gate structure | Gauri Karve, Cristiano Capasso, Srikanth B. Samavedam, James K. Schaeffer | 2010-02-23 |
| 7560318 | Process for forming an electronic device including semiconductor layers having different stresses | Mariam Sadaka, Venkat R. Kolagunta, Victor H. Vartanian | 2009-07-14 |
| 7544595 | Forming a semiconductor device having a metal electrode and structure thereof | — | 2009-06-09 |
| 7445981 | Method for forming a dual metal gate structure | Gauri Karve, Cristiano Capasso, Srikanth B. Samavedam, James K. Schaeffer | 2008-11-04 |
| 7365410 | Semiconductor structure having a metallic buffer layer and method for forming | Alexander Demkov | 2008-04-29 |
| 7179700 | Semiconductor device with low resistance contacts | Olubunmi O. Adetutu | 2007-02-20 |
| 6849515 | Semiconductor process for disposable sidewall spacers | Cesar M. Garza | 2005-02-01 |
| 6849487 | Method for forming an electronic structure using etch | Olubunmi O. Adetutu, Steven G. H. Anderson | 2005-02-01 |
| 6594422 | Opto-coupling device structure and method therefor | Wei Wu, Sebastian Csutak | 2003-07-15 |
| 6573160 | Method of recrystallizing an amorphous region of a semiconductor | Marius Orlowski, David C. Gilmer, Prasad Alluri, Christopher C. Hobbs, Michael Rendon +1 more | 2003-06-03 |
| 6514808 | Transistor having a high K dielectric and short gate length and method therefor | Srikanth B. Samavedam, Christopher C. Hobbs | 2003-02-04 |
| 6475841 | Transistor with shaped gate electrode and method therefor | Srikanth B. Samavedam, Nigel G. Cave | 2002-11-05 |
| 6423632 | Semiconductor device and a process for forming the same | Srikanth B. Samavedam, Philip J. Tobin | 2002-07-23 |
| 6362071 | Method for forming a semiconductor device with an opening in a dielectric layer | Bich-Yen Nguyen, Philip J. Tobin, David L. O'Meara, Percy V. Gilbert, Yeong-Jyh T. Lii +1 more | 2002-03-26 |