Issued Patents All Time
Showing 26–50 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8089609 | Lithographic apparatus and device manufacturing method | Harry Sewell | 2012-01-03 |
| 7898646 | Using an interferometer as a high speed variable attenuator | Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Teunis Cornelis van den Dool, Daniel Pérez Calero | 2011-03-01 |
| 7773199 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Wenceslao A. Cebuhar, Azat Latypov, Yuli Vladimirsky | 2010-08-10 |
| 7751030 | Interferometric lithographic projection apparatus | Louis John Markoya, Aleksandr Khmelichek, Diane McCafferty, Harry Sewell | 2010-07-06 |
| 7683300 | Using an interferometer as a high speed variable attenuator | Oscar Franciscus Jozephus Noordman | 2010-03-23 |
| 7630054 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Wenceslao A. Cebuhar, Azat Latypov, Yuli Vladimirsky | 2009-12-08 |
| 7511826 | Symmetrical illumination forming system and method | — | 2009-03-31 |
| 7445883 | Lithographic printing with polarized light | Nabila Baba-Ali, Harry Sewell | 2008-11-04 |
| 7298459 | Wafer handling method for use in lithography patterning | Santiago del Puerto, Stephen Roux | 2007-11-20 |
| 7274468 | Optical beam shearing apparatus | Henry A. Hill | 2007-09-25 |
| 7248336 | Method and system for improving focus accuracy in a lithography system | Michael L. Nelson, Peter L. Filosi, Christopher Mason | 2007-07-24 |
| 7239446 | Optical reduction system with control of illumination polarization | — | 2007-07-03 |
| 7180573 | System and method to block unwanted light reflecting from a pattern generating portion from reaching an object | Matthew Lipson, Christopher Mason | 2007-02-20 |
| 7139080 | Interferometry systems involving a dynamic beam-steering assembly | Henry A. Hill | 2006-11-21 |
| 7133121 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region | Arno Jan Bleeker, Wenceslao A. Cebuhar, Azat Latypov, Yuli Vladimirsky | 2006-11-07 |
| 7112813 | Device inspection method and apparatus using an asymmetric marker | Arie Jeffrey Den Boef, Frank Bornebroek, Hugo Augustinus Joseph Cramer, Mircea Dusa, Richard Johannes Franciscus Van Haren +7 more | 2006-09-26 |
| 7090964 | Lithographic printing with polarized light | Nabila Baba-Ali, Harry Sewell | 2006-08-15 |
| 7084987 | Method and system to interferometrically detect an alignment mark | — | 2006-08-01 |
| 7053984 | Method and systems for improving focus accuracy in a lithography system | Michael L. Nelson, Peter L. Filosi, Christopher Mason | 2006-05-30 |
| 7031077 | Optical reduction method with elimination of reticle diffraction induced bias | — | 2006-04-18 |
| 6927842 | Wafer handling method for use in lithography patterning | Santiago del Puerto, Stephen Roux | 2005-08-09 |
| 6917432 | Interferometers for measuring changes in optical beam direction | Henry A. Hill | 2005-07-12 |
| 6876440 | METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION | Arno Jan Bleeker, Wenceslao A. Cebuhar, Azat Latypov, Yuli Vladimirsky | 2005-04-05 |
| 6859260 | Method and system for improving focus accuracy in a lithography system | Michael L. Nelson, Peter L. Filosi, Christopher Mason | 2005-02-22 |
| 6836380 | Optical reduction system with elimination of reticle diffraction induced bias | — | 2004-12-28 |