Issued Patents All Time
Showing 76–100 of 123 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10456808 | Selective deposition of metals, metal oxides, and dielectrics | Suvi Haukka, Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen +2 more | 2019-10-29 |
| 10453701 | Deposition of organic films | Eva Tois, Hidemi Suemori, Suvi Haukka, Varun Sharma, Jan Willem Maes +2 more | 2019-10-22 |
| 10443123 | Dual selective deposition | Suvi Haukka, Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen +1 more | 2019-10-15 |
| 10424477 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen | 2019-09-24 |
| 10424476 | Formation of SiOCN thin films | Toshiya Suzuki | 2019-09-24 |
| 10410857 | Formation of SiN thin films | Toshiya Suzuki, Shang Chen, Ryoko Yamada, Dai Ishikawa, Kunitoshi Namba | 2019-09-10 |
| 10410856 | Deposition of boron and carbon containing materials | — | 2019-09-10 |
| 10395917 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka | 2019-08-27 |
| 10373820 | Deposition of organic films | Eva Tois, Hidemi Suemori, Suvi Haukka, Varun Sharma | 2019-08-06 |
| 10343186 | Vapor phase deposition of organic films | Marko Tuominen, Hannu Huotari | 2019-07-09 |
| 10308673 | Synthesis and use of precursors for ALD of tellurium and selenium thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2019-06-04 |
| 10262854 | Deposition of SiN | Shang Chen, Ryoko Yamada, Antti Niskanen | 2019-04-16 |
| 10208379 | Synthesis and use of precursors for ALD of group VA element containing thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2019-02-19 |
| 10199211 | Atomic layer deposition of silicon carbon nitride based materials | — | 2019-02-05 |
| 10177025 | Method and apparatus for filling a gap | — | 2019-01-08 |
| 10047435 | Dual selective deposition | Suvi Haukka, Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen +1 more | 2018-08-14 |
| 10043880 | Metal silicide, metal germanide, methods for making the same | Suvi Haukka, Tom E. Blomberg, Eva Tois | 2018-08-07 |
| 10002755 | Process for deposition of titanium oxynitride for use in integrated circuit fabrication | Seiji Okura, Hidemi Suemori | 2018-06-19 |
| 9922817 | Deposition of boron and carbon containing materials | — | 2018-03-20 |
| 9905416 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka | 2018-02-27 |
| 9895715 | Selective deposition of metals, metal oxides, and dielectrics | Suvi Haukka, Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen +2 more | 2018-02-20 |
| 9887082 | Method and apparatus for filling a gap | Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Gido Van Der Star, Toshiya Suzuki | 2018-02-06 |
| 9837263 | Atomic layer deposition of silicon carbon nitride based materials | — | 2017-12-05 |
| 9828674 | Synthesis and use of precursors for ALD of group VA element containing thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2017-11-28 |
| 9824881 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen | 2017-11-21 |