Issued Patents All Time
Showing 51–75 of 123 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11133181 | Formation of SiN thin films | Toshiya Suzuki, Shang Chen, Ryoko Yamada, Dai Ishikawa, Kunitoshi Namba | 2021-09-28 |
| 11107676 | Method and apparatus for filling a gap | Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Gido Van Der Star, Toshiya Suzuki | 2021-08-31 |
| 11107673 | Formation of SiOCN thin films | Toshiya Suzuki | 2021-08-31 |
| 11072622 | Synthesis and use of precursors for ALD of tellurium and selenium thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2021-07-27 |
| 11069522 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka | 2021-07-20 |
| 11047040 | Dual selective deposition | Suvi Haukka, Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen +1 more | 2021-06-29 |
| 10991573 | Uniform deposition of SiOC on dielectric and metal surfaces | Lingyun Jia, Eva Tois, Sun Ja Kim | 2021-04-27 |
| 10941487 | Synthesis and use of precursors for ALD of group VA element containing thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2021-03-09 |
| 10923361 | Deposition of organic films | Eva Tois, Hidemi Suemori, Suvi Haukka, Varun Sharma, Jan Willem Maes +2 more | 2021-02-16 |
| 10872765 | Selective layer formation using deposition and removing | Eva Tois | 2020-12-22 |
| 10854460 | Deposition of organic films | Eva Tois, Hidemi Suemori, Suvi Haukka, Varun Sharma | 2020-12-01 |
| 10818489 | Atomic layer deposition of silicon carbon nitride based material | — | 2020-10-27 |
| 10814349 | Vapor phase deposition of organic films | Marko Tuominen, Hannu Huotari | 2020-10-27 |
| 10790137 | Deposition of boron and carbon containing materials | — | 2020-09-29 |
| 10741386 | Deposition of SiN | Shang Chen, Ryoko Yamada, Antti Niskanen | 2020-08-11 |
| 10741385 | Method and apparatus for filling a gap | Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Gido Van Der Star, Toshiya Suzuki | 2020-08-11 |
| 10707082 | Methods for depositing thin films comprising indium nitride by atomic layer deposition | Suvi Haukka, Antti Niskanen | 2020-07-07 |
| 10695794 | Vapor phase deposition of organic films | Marko Tuominen, Hannu Huotari | 2020-06-30 |
| 10619244 | Synthesis and use of precursors for ALD of group VA element containing thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2020-04-14 |
| 10600637 | Formation of SiOC thin films | Toshiya Suzuki, Hannu Huotari | 2020-03-24 |
| 10553440 | Methods for depositing nickel films and for making nickel silicide and nickel germanide | Suvi Haukka, Tom E. Blomberg, Eva Tois | 2020-02-04 |
| 10546744 | Process for deposition of titanium oxynitride for use in integrated circuit fabrication | Seiji Okura, Hidemi Suemori | 2020-01-28 |
| 10515794 | Atomic layer deposition of silicon carbon nitride based materials | — | 2019-12-24 |
| 10510529 | Formation of SiOCN thin films | Toshiya Suzuki | 2019-12-17 |
| 10460928 | Process for deposition of titanium oxynitride for use in integrated circuit fabrication | Seiji Okura, Hidemi Suemori | 2019-10-29 |