Issued Patents All Time
Showing 101–123 of 123 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9812320 | Method and apparatus for filling a gap | Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde, Suvi Haukka +2 more | 2017-11-07 |
| 9783563 | Synthesis and use of precursors for ALD of tellurium and selenium thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2017-10-10 |
| 9786491 | Formation of SiOCN thin films | Toshiya Suzuki | 2017-10-10 |
| 9786492 | Formation of SiOCN thin films | Toshiya Suzuki | 2017-10-10 |
| 9646820 | Methods for forming conductive titanium oxide thin films | Mikko Ritala, Markku Leskelä | 2017-05-09 |
| 9634106 | Doped metal germanide and methods for making the same | Suvi Haukka, Tom E. Blomberg, Eva Tois | 2017-04-25 |
| 9576792 | Deposition of SiN | Shang Chen, Ryoko Yamada, Antti Niskanen | 2017-02-21 |
| 9576790 | Deposition of boron and carbon containing materials | Yosuke Kimura, Kunitoshi Namba, Wataru Adachi, Hideaki Fukuda, Werner Knaepen +2 more | 2017-02-21 |
| 9564309 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka | 2017-02-07 |
| 9543140 | Deposition of boron and carbon containing materials | — | 2017-01-10 |
| 9540729 | Deposition of titanium nanolaminates for use in integrated circuit fabrication | Seiji Okura, Hidemi Suemori | 2017-01-10 |
| 9523148 | Process for deposition of titanium oxynitride for use in integrated circuit fabrication | Seiji Okura, Hidemi Suemori | 2016-12-20 |
| 9428842 | Methods for increasing growth rate during atomic layer deposition of thin films | — | 2016-08-30 |
| 9401273 | Atomic layer deposition of silicon carbon nitride based materials | — | 2016-07-26 |
| 9379011 | Methods for depositing nickel films and for making nickel silicide and nickel germanide | Suvi Haukka, Tom E. Blomberg, Eva Tois | 2016-06-28 |
| 9362109 | Deposition of boron and carbon containing materials | — | 2016-06-07 |
| 9315896 | Synthesis and use of precursors for ALD of group VA element containing thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2016-04-19 |
| 9175390 | Synthesis and use of precursors for ALD of tellurium and selenium thin films | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2015-11-03 |
| 9129897 | Metal silicide, metal germanide, methods for making the same | Suvi Haukka, Tom E. Blomberg, Eva Tois | 2015-09-08 |
| 8945675 | Methods for forming conductive titanium oxide thin films | Mikko Ritala, Markku Leskelä | 2015-02-03 |
| 8871617 | Deposition and reduction of mixed metal oxide thin films | Eva Tois | 2014-10-28 |
| 8846502 | Methods for depositing thin films comprising gallium nitride by atomic layer deposition | Suvi Haukka, Antti Niskanen | 2014-09-30 |
| 8372483 | Methods for forming thin films comprising tellurium | Timo Hatanpää, Mikko Ritala, Markku Leskelä | 2013-02-12 |