Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9646876 | Aluminum nitride barrier layer | Deenesh Padhi, Srinivas Guggilla, Alexandros T. Demos, Bhaskar Kumar, Priyanka DASH | 2017-05-09 |
| 9640424 | Integrated metal spacer and air gap interconnect | Mehul Naik | 2017-05-02 |
| 9601431 | Dielectric/metal barrier integration to prevent copper diffusion | Mehul Naik, Yong Cao, Mei-Yee Shek, Yana Cheng, Sree Rangasai V. Kesapragada | 2017-03-21 |
| 9576810 | Process for etching metal using a combination of plasma and solid state sources | Subhash Deshmukh, Joseph R. Johnson, Jingjing Liu | 2017-02-21 |
| 9514953 | Methods for barrier layer removal | Chia-Ling Kao, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani, Mehul Naik | 2016-12-06 |
| 9508561 | Methods for forming interconnection structures in an integrated cluster system for semicondcutor applications | Mehul Naik, Srinivas D. Nemani, Takehito Koshizawa | 2016-11-29 |
| 9384997 | Dry-etch selectivity | Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park, Saurabh Garg +2 more | 2016-07-05 |
| 9312168 | Air gap structure integration using a processing system | Mehul Naik, Zhenjiang Cui | 2016-04-12 |
| 9305831 | Integrated metal spacer and air gap interconnect | Mehul Naik | 2016-04-05 |
| 9299605 | Methods for forming passivation protection for an interconnection structure | Mehul Naik, Yong Cao, Sree Rangasai V. Kesapragada, Mei-Yee Shek, Yana Cheng | 2016-03-29 |
| 9299577 | Methods for etching a dielectric barrier layer in a dual damascene structure | Chia-Ling Kao, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani, Mehul Naik | 2016-03-29 |
| 9269563 | Methods for forming interconnect structure utilizing selective protection process for hardmask removal process | Mehul Naik | 2016-02-23 |
| 9257330 | Ultra-thin structure to protect copper and method of preparation | Amit Chatterjee, Geetika Bajaj, Pramit Manna, Tapash Chakraborty, Srinivas D. Nemani +3 more | 2016-02-09 |
| 8969212 | Dry-etch selectivity | Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park, Saurabh Garg +2 more | 2015-03-03 |