Issued Patents All Time
Showing 76–89 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5685916 | Dry cleaning of semiconductor processing chambers | Yan Ye, Charles S. Rhoades | 1997-11-11 |
| 5676759 | Plasma dry cleaning of semiconductor processing chambers | Yan Ye, Charles S. Rhoades | 1997-10-14 |
| 5643394 | Gas injection slit nozzle for a plasma process reactor | Dan Maydan, Steve S. Y. Mak, Donald Olgado, Timothy D. Driscoll, Brian Sy-Yuan Shieh +1 more | 1997-07-01 |
| 5607542 | Inductively enhanced reactive ion etching | Robert Wu | 1997-03-04 |
| 5573596 | Arc suppression in a plasma processing system | — | 1996-11-12 |
| 5565681 | Ion energy analyzer with an electrically controlled geometric filter | Peter Loewenhardt | 1996-10-15 |
| 5556501 | Silicon scavenger in an inductively coupled RF plasma reactor | Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +7 more | 1996-09-17 |
| 5540824 | Plasma reactor with multi-section RF coil and isolated conducting lid | Hiroji Hanawa, Diana Xiabing Ma, Donald Olgado | 1996-07-30 |
| 5534108 | Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor | Xue-Yu Qian, Graham W. Hills, Robert Steger | 1996-07-09 |
| 5486235 | Plasma dry cleaning of semiconductor processing chambers | Yan Ye, Charles S. Rhoades | 1996-01-23 |
| 5451784 | Composite diagnostic wafer for semiconductor wafer processing systems | Peter Loewenhardt, Hiroji Hanawa | 1995-09-19 |
| 5198725 | Method of producing flat ECR layer in microwave plasma device and apparatus therefor | Ching-Hwa Chen, Takashi Inoue | 1993-03-30 |
| 4871421 | Split-phase driver for plasma etch system | John S. Ogle | 1989-10-03 |
| 4808259 | Plasma etching process for MOS circuit pregate etching utiliizing a multi-step power reduction recipe | Don W. Jillie, Jr., Glen Wada | 1989-02-28 |