DW

Derick J. Wristers

AM AMD: 151 patents #11 of 9,279Top 1%
🗺 Texas: #176 of 125,132 inventorsTop 1%
Overall (All Time): #6,064 of 4,157,543Top 1%
152
Patents All Time

Issued Patents All Time

Showing 26–50 of 152 patents

Patent #TitleCo-InventorsDate
6674135 Semiconductor structure having elevated salicided source/drain regions and metal gate electrode on nitride/oxide dielectric Jon D. Cheek, Mark I. Gardner 2004-01-06
6661057 Tri-level segmented control transistor and fabrication method Robert Dawson, Mark I. Gardner, Frederick N. Hause, H. Jim Fulford, Mark W. Michael +1 more 2003-12-09
6638829 Semiconductor structure having a metal gate electrode and elevated salicided source/drain regions and a method for manufacture Jon D. Cheek, Mark I. Gardner 2003-10-28
6589847 Tilted counter-doped implant to sharpen halo profile Daniel Kadosh, Scott Luning 2003-07-08
6580122 Transistor device having an enhanced width dimension and a method of making same Jon D. Cheek, John G. Pellerin 2003-06-17
6566696 Self-aligned VT implant Jon D. Cheek, Mark W. Michael, James F. Buller 2003-05-20
6552776 Photolithographic system including light filter that compensates for lens error Robert Dawson, H. Jim Fulford, Mark I. Gardner, Frederick N. Hause, Bradley T. Moore +1 more 2003-04-22
6433400 Semiconductor fabrication employing barrier atoms incorporated at the edges of a trench isolation structure Mark I. Gardner, H. Jim Fulford 2002-08-13
6417539 High density memory cell assembly and methods Mark I. Gardner, Jon D. Cheek 2002-07-09
6410409 Implanted barrier layer for retarding upward diffusion of substrate dopant Mark I. Gardner, Robert Dawson, H. Jim Fulford, Frederick N. Hause, Mark W. Michael +1 more 2002-06-25
6406964 Method of controlling junction recesses in a semiconductor device Jon D. Cheek, John G. Pellerin 2002-06-18
6380055 Dopant diffusion-retarding barrier region formed within polysilicon gate layer Mark I. Gardner, Robert Dawson, H. Jim Fulford, Frederick N. Hause, Mark W. Michael +1 more 2002-04-30
6372588 Method of making an IGFET using solid phase diffusion to dope the gate, source and drain Robert Dawson, H. Jim Fulford, Mark I. Gardner, Frederick N. Hause, Mark W. Michael +1 more 2002-04-16
6372587 Angled halo implant tailoring using implant mask Jon D. Cheek, Scott Luning 2002-04-16
6346426 Method and apparatus for characterizing semiconductor device performance variations based on independent critical dimension measurements Anthony J. Toprac, Jon D. Cheek 2002-02-12
6323519 Ultrathin, nitrogen-containing MOSFET sidewall spacers using low-temperature semiconductor fabrication process Mark I. Gardner, Charles E. May 2001-11-27
6316302 Isotropically etching sidewall spacers to be used for both an NMOS source/drain implant and a PMOS LDD implant Jon D. Cheek, Anthony J. Toprac 2001-11-13
6300205 Method of making a semiconductor device with self-aligned active, lightly-doped drain, and halo regions H. Jim Fulford, Jon D. Cheek, James F. Buller 2001-10-09
6274415 Self-aligned Vt implant Jon D. Cheek, Mark W. Michael, James F. Buller 2001-08-14
6261936 Poly gate CD passivation for metrology control Marilyn I. Wright, Jon D. Cheek 2001-07-17
6258680 Integrated circuit gate conductor which uses layered spacers to produce a graded junction H. Jim Fulford, Mark I. Gardner 2001-07-10
6258646 CMOS integrated circuit and method for implanting NMOS transistor areas prior to implanting PMOS transistor areas to optimize the thermal diffusivity thereof H. Jim Fulford, Mark I. Gardner 2001-07-10
6259142 Multiple split gate semiconductor device and fabrication method Robert Dawson, Mark I. Gardner, Frederick N. Hause, H. Jim Fulford, Mark W. Michael +1 more 2001-07-10
6245689 Process for reliable ultrathin oxynitride formation Ming-Yin Hao, Robert B. Ogle 2001-06-12
6245649 Method for forming a retrograde impurity profile James F. Buller, Jon D. Cheek, Daniel Kadosh, H. Jim Fulford 2001-06-12