Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204239 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more | 2021-12-21 |
| 11187995 | Metrology using a plurality of metrology target measurement recipes | Victor Emanuel Calado, Youping Zhang, Richard Johannes Franciscus Van Haren, Xing Lan Liu | 2021-11-30 |
| 11125806 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Patrick Warnaar, Vasco Tomas Tenner | 2021-09-21 |
| 11126093 | Focus and overlay improvement by modifying a patterning device | Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut, Leon Paul VAN DIJK, Willem Seine Christian Roelofs, Wim Tjibbo Tel +1 more | 2021-09-21 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |
| 11003099 | Method and apparatus for design of a metrology target | Murat Bozkurt, Patrick Warnaar, Stefan Cornelis Theodorus Van Der Sanden | 2021-05-11 |
| 10996570 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Elliott Gerard McNamara +6 more | 2021-05-04 |
| 10955353 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2021-03-23 |