PT

Patricius Aloysius Jacobus Tinnemans

AB Asml Netherlands B.V.: 8 patents #9 of 741Top 2%
📍 Hapert, NL: #1 of 1 inventorsTop 100%
Overall (2021): #12,113 of 548,734Top 3%
8
Patents 2021

Issued Patents 2021

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
11181836 Method for determining deformation Edo Maria Hulsebos, Franciscus Godefridus Casper Bijnen 2021-11-23
11125806 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate Patrick Warnaar, Vasco Tomas Tenner, Maurits Van Der Schaar 2021-09-21
11067902 Computational metrology Patrick Warnaar, Grzegorz Grzela, Everhardus Cornelis Mos, Wim Tjibbo Tel, Marinus Jochemsen +2 more 2021-07-20
11029610 Lithographic method Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees, Willem Seine Christian Roelofs +11 more 2021-06-08
11022902 Sensor, lithographic apparatus, and device manufacturing method Arie Jeffrey Den Boef, Haico Victor Kok, William Peter Van Drent, Sebastianus Adrianus GOORDEN 2021-06-01
11009343 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela +1 more 2021-05-18
10962887 Lithographic method Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar +13 more 2021-03-30
10901326 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Edo Maria Hulsebos, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2021-01-26