| 11170072 |
Method and apparatus for inspection and metrology |
Velislava IGNATOVA, Erik Weber Jensen, Michael Kubis, Hubertus Johannes Gertrudus Simons, Peter Ten Berge +2 more |
2021-11-09 |
| 11099487 |
Method and apparatus for optimization of lithographic process |
Marc Hauptmann, Weitian Kou, Alexander Ypma, Michiel Kupers, Hyunwoo Yu +1 more |
2021-08-24 |
| 11067902 |
Computational metrology |
Patrick Warnaar, Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Wim Tjibbo Tel, Marinus Jochemsen +2 more |
2021-07-20 |
| 11061336 |
Device manufacturing method |
Hubertus Johannes Gertrudus Simons, Xiuhong Wei, Reza Mahmoodi Baram, Hadi YAGUBIZADE, Yichen Zhang |
2021-07-13 |
| 11036146 |
Method and apparatus to reduce effects of nonlinear behavior |
Richard Johannes Franciscus Van Haren, Peter Ten Berge, Peter Hanzen Wardenier, Erik Weber Jensen, Hakki Ergün Cekli |
2021-06-15 |
| 10996176 |
Methods and apparatus for measuring a property of a substrate |
Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more |
2021-05-04 |
| 10990018 |
Computational metrology |
Wim Tjibbo Tel, Bart Peter Bert Segers, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more |
2021-04-27 |
| 10928737 |
Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program |
Jochem Sebastiaan Wildenberg, Roy Werkman, Erik Johannes Maria Wallerbos |
2021-02-23 |
| 10915689 |
Method and apparatus to correct for patterning process error |
Peter Ten Berge, Richard Johannes Franciscus Van Haren, Peter Hanzen Wardenier, Erik Weber Jensen, Bernardo Kastrup +5 more |
2021-02-09 |