Issued Patents 2021
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11199782 | Lithographic process and apparatus and inspection process and apparatus | Hans Erik KATTOUW, Valerio ALTINI, Bearrach Moest | 2021-12-14 |
| 11143971 | Control based on probability density function of parameter | Marc Jurian Kea, Roy ANUNCIADO | 2021-10-12 |
| 11126093 | Focus and overlay improvement by modifying a patterning device | Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut, Leon Paul VAN DIJK, Willem Seine Christian Roelofs, Stefan Hunsche +1 more | 2021-09-21 |
| 11112700 | Optimization of a lithographic projection apparatus accounting for an interlayer characteristic | Laurent Michel Marcel Depre, Jorge Humberto Salvador Entradas | 2021-09-07 |
| 11079687 | Process window based on defect probability | Abraham SLACHTER, Stefan Hunsche, Anton Bernhard Van Oosten, Koenraad VAN INGEN SCHENAU, Gijsbert Rispens +1 more | 2021-08-03 |
| 11067902 | Computational metrology | Patrick Warnaar, Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Everhardus Cornelis Mos, Marinus Jochemsen +2 more | 2021-07-20 |
| 11029614 | Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus | Frank Staals, Martin Jules Marie-Emile De Nivelle, Tanbir HASAN | 2021-06-08 |
| 10990018 | Computational metrology | Bart Peter Bert Segers, Everhardus Cornelis Mos, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more | 2021-04-27 |
| 10962886 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Marinus Jochemsen, Stefan Hunsche | 2021-03-30 |