Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11150560 | Projection system and mirror and radiation source for a lithographic apparatus | Marcus Adrianus Van De Kerkhof, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal | 2021-10-19 |
| 11079687 | Process window based on defect probability | Abraham SLACHTER, Stefan Hunsche, Wim Tjibbo Tel, Koenraad VAN INGEN SCHENAU, Gijsbert Rispens +1 more | 2021-08-03 |
| 11054754 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Frank Staals, Yasri Yudhistira, Carlo Cornelis Maria Luijten, Bert Verstraeten, Jan-Willem Gemmink | 2021-07-06 |