Issued Patents 2021
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-10-12 |
| 11099489 | Method of measuring a parameter of a lithographic process, metrology apparatus | Hilko Dirk Bos, Erik Johan Koop, Armand Eugene Albert Koolen, Han-Kwang Nienhuys, Alessandro Polo +2 more | 2021-08-24 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-08-24 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2021-08-17 |
| 11009343 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Patrick Warnaar, Grzegorz Grzela +1 more | 2021-05-18 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10955756 | Method of measuring a target, metrology apparatus, lithographic cell, and target | — | 2021-03-23 |
| 10901323 | Metrology method and apparatus with increased bandwidth | Seyed Iman Mossavat, Paul Christiaan Hinnen | 2021-01-26 |