Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204239 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2021-12-21 |
| 11181828 | Method of determining a value of a parameter of interest of a patterning process, device manufacturing method | Patrick Warnaar, Hilko Dirk Bos, Mohammadreza Hajiahmadi, Lukasz Jerzy Macht, Karel Hendrik Wouter VAN DEN BOS +2 more | 2021-11-23 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |