Issued Patents 2021
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143972 | Method and apparatus to determine a patterning process parameter | Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2021-10-12 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-10-12 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |
| 11022897 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Joannes Jitse Venselaar, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss +3 more | 2021-06-01 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |