Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10804167 | Methods and systems for co-located metrology | David Y. Wang, Esen Salcin, Michael Friedmann, Derrick Shaughnessy, Jonathan M. Madsen +1 more | 2020-10-13 |
| 10801975 | Metrology tool with combined X-ray and optical scatterometers | Michael S. Bakeman | 2020-10-13 |
| 10801953 | Semiconductor metrology based on hyperspectral imaging | David Y. Wang, Alexander Buettner, Stilian Ivanov Pandev, Emanuel Saerchen, Barry Blasenheim | 2020-10-13 |
| 10767978 | Transmission small-angle X-ray scattering metrology system | Antonio Arion Gellineau, Sergey Zalubovsky | 2020-09-08 |
| 10769320 | Integrated use of model-based metrology and a process model | Alexander Kuznetsov, Stilian Ivanov Pandev | 2020-09-08 |
| 10732516 | Process robust overlay metrology based on optical scatterometry | Stilian Ivanov Pandev, Wei Lu | 2020-08-04 |
| 10712145 | Hybrid metrology for patterned wafer characterization | Boxue Chen, Andrei Veldman, Alexander Kuznetsov | 2020-07-14 |
| 10648796 | Optical metrology with small illumination spot size | Noam Sapiens, Kevin Peterlinz, Alexander Buettner, Kerstin Purrucker | 2020-05-12 |
| 10612916 | Measurement of multiple patterning parameters | Shankar Krishnan, Kevin Peterlinz, Thaddeus Gerard Dziura, Noam Sapiens, Stilian Ivanov Pandev | 2020-04-07 |
| 10545104 | Computationally efficient X-ray based overlay measurement | John J. Hench, Michael S. Bakeman | 2020-01-28 |
| 10533848 | Metrology and control of overlay and edge placement errors | Frank Laske, Nadav Gutman | 2020-01-14 |