MS

Maurits Van Der Schaar

AB Asml Netherlands B.V.: 9 patents #16 of 721Top 3%
Overall (2019): #10,575 of 560,194Top 2%
9
Patents 2019

Issued Patents 2019

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
10481506 Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method Murat Bozkurt, Patrick Warnaar, Martin Jacobus Johan Jak, Mohammadreza Hajiahmadi, Grzegorz Grzela +1 more 2019-11-19
10481503 Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more 2019-11-19
10474039 Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method Paul Christiaan Hinnen, Simon Gijsbert Josephus Mathijssen, Maikel Robert GOOSEN, Arie Jeffrey Den Boef 2019-11-12
10474043 Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method Patrick Warnaar, Grzegorz Grzela, Erik Johan Koop, Victor Emanuel Calado, Si-Han Zeng 2019-11-12
10437163 Method and apparatus for design of a metrology target Murat Bozkurt, Patrick Warnaar, Stefan Cornelis Theodorus Van Der Sanden 2019-10-08
10386176 Metrology method, target and substrate Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more 2019-08-20
10331041 Metrology method and apparatus, lithographic system and device manufacturing method Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Markus Gerardus Martinus Maria Van Kraaij 2019-06-25
10241055 Method and apparatus for angular-resolved spectroscopic lithography characterization Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more 2019-03-26
10180628 Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method Hugo Augustinus Joseph Cramer, Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Te-Chih Huang 2019-01-15