Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2019-11-19 |
| 10386176 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2019-08-20 |
| 10331041 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij | 2019-06-25 |
| 10331043 | Optimization of target arrangement and associated target | Henricus Wilhelmus Maria Van Buel, Johannes Marcus Maria Beltman, Xing Lan Liu, Richard Johannes Franciscus Van Haren | 2019-06-25 |