Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2019-11-19 |
| 10453758 | Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2019-10-22 |
| 10379446 | Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes | Sinatra Canggih KHO, Adriaan Johan Van Leest | 2019-08-13 |