Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Alok Verma +3 more | 2019-11-19 |
| 10453758 | Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion | Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2019-10-22 |
| 10379446 | Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes | Alok Verma, Sinatra Canggih KHO | 2019-08-13 |
| 10369752 | Metrology method and apparatus, computer program and lithographic system | Seyed Iman Mossavat | 2019-08-06 |