Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2019-11-19 |
| 10423075 | Methods and systems for pattern design with tailored response to wavefront aberration | Hanying Feng, Yu Cao, Jun Ye | 2019-09-24 |
| 10296681 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Eric Kent, Yen-Wen Lu, Paul Anthony Tuffy +3 more | 2019-05-21 |