Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10401739 | Method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus | — | 2019-09-03 |
| 10331041 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij | 2019-06-25 |
| 10234771 | HHG source, inspection apparatus and method for performing a measurement | Nan Lin, Arie Jeffrey Den Boef, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen | 2019-03-19 |