Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10488768 | Beat patterns for alignment on small metrology targets | Bastiaan Onne Fagginger Auer, Paul Christiaan Hinnen, Anagnostis Tsiatmas, Mariya Vyacheslavivna Medvedyeva | 2019-11-26 |
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2019-11-19 |
| 10453758 | Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2019-10-22 |
| 10394135 | Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatus | Bastiaan Onne Fagginger Auer | 2019-08-27 |
| 10317805 | Method for monitoring a characteristic of illumination from a metrology apparatus | Jolanda Theodora Josephina Schmetz-Schagen, Armand Eugene Albert Koolen, Bastiaan Onne Fagginger Auer | 2019-06-11 |
| 10180628 | Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method | Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Maurits Van Der Schaar, Te-Chih Huang | 2019-01-15 |