| 9515156 |
Air gap spacer integration for improved fin device performance |
Paul R. Besser, Yoshie Kimura, Gerardo Delgadino, Harald Orkorn-Schmidt, Dengliang Yang |
2016-12-06 |
| 9425078 |
Inhibitor plasma mediated atomic layer deposition for seamless feature fill |
Wei Tang, Jun Qian, Hu Kang, Adrien LaVoie, Deenesh Padhi +1 more |
2016-08-23 |
| 9406544 |
Systems and methods for eliminating seams in atomic layer deposition of silicon dioxide film in gap fill applications |
Wei Tang, Jason D. Park, Kaihan Ashtiani |
2016-08-02 |
| 9379210 |
Sacrificial pre-metal dielectric for self-aligned contact scheme |
Thomas W. Mountsier, Ananda Banerji, Nagraj Shankar |
2016-06-28 |
| 9362133 |
Method for forming a mask by etching conformal film on patterned ashable hardmask |
Nader Shamma, Sirish Reddy, Chunhai Ji |
2016-06-07 |
| 9355886 |
Conformal film deposition for gapfill |
Shankar Swaminathan, Adrien LaVoie, Sesha Varadarajan, Jason D. Park, Michal Danek +1 more |
2016-05-31 |
| 9257274 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method |
Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann +1 more |
2016-02-09 |
| 9230800 |
Plasma activated conformal film deposition |
Adrien LaVoie, Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh +9 more |
2016-01-05 |
