Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9490149 | Chemical deposition apparatus having conductance control | Karl Leeser, Chunguang Xia, Jeremy Tucker | 2016-11-08 |
| 9388494 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Douglas Keil, Edward Augustyniak, Karl Leeser | 2016-07-12 |
| 9334566 | Multi-tray ballast vapor draw systems | Davis Weymann | 2016-05-10 |
| 9236244 | Sequential precursor dosing in an ALD multi-station/batch reactor | Adrien LaVoie, Damien Slevin, Karl Leeser | 2016-01-12 |
| 9230800 | Plasma activated conformal film deposition | Adrien LaVoie, Shankar Swaminathan, Hu Kang, Tom Dorsh, Dennis M. Hausmann +9 more | 2016-01-05 |