| 9490149 |
Chemical deposition apparatus having conductance control |
Ramesh Chandrasekharan, Chunguang Xia, Jeremy Tucker |
2016-11-08 |
| 9484233 |
Carousel reactor for multi-station, sequential processing systems |
— |
2016-11-01 |
| 9449795 |
Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor |
Mohamed Sabri, Edward Augustyniak, Douglas Keil, Ramkishan Rao Lingampalli, Cody Barnett |
2016-09-20 |
| 9441296 |
Hybrid ceramic showerhead |
Mohamed Sabri, Ramkishan Rao Lingampalli |
2016-09-13 |
| 9443722 |
Cyclical, non-isobaric, pore sealing method to prevent precursor penetration into the substrate |
— |
2016-09-13 |
| 9388494 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region |
Chunguang Xia, Ramesh Chandrasekharan, Douglas Keil, Edward Augustyniak |
2016-07-12 |
| 9315899 |
Contoured showerhead for improved plasma shaping and control |
James S. Sims |
2016-04-19 |
| 9263350 |
Multi-station plasma reactor with RF balancing |
Sunil Kapoor, Adrien LaVoie, Yaswanth Rangineni |
2016-02-16 |
| 9255329 |
Modulated ion-induced atomic layer deposition (MII-ALD) |
Tony P. Chiang |
2016-02-09 |
| 9236244 |
Sequential precursor dosing in an ALD multi-station/batch reactor |
Ramesh Chandrasekharan, Adrien LaVoie, Damien Slevin |
2016-01-12 |
