EL

Erik Roelof Loopstra

AB Asml Netherlands B.V.: 7 patents #1 of 195Top 1%
AN Asml Holding N.V.: 1 patents #21 of 56Top 40%
CG Carl Zeiss Smt Gmbh: 1 patents #28 of 81Top 35%
📍 Ederheim, DE: #1 of 2 inventorsTop 50%
Overall (2005): #1,553 of 245,428Top 1%
9
Patents 2005

Issued Patents 2005

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
6967756 Lithographic apparatus device manufacturing method and device manufactured thereby Antonius Johannes Josephus Van Dijsseldonk, Dominicus Jacobus Petrus Adrianus Franken 2005-11-22
6952253 Lithographic apparatus and device manufacturing method Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Theodorus Marinus Modderman +7 more 2005-10-04
6927403 Illumination system that suppresses debris from a light source Wolfgang Singer, Martin Antoni, Johannes Wangler, Wilhelm Egle, Vadim Yevgenyevich Banine 2005-08-09
6906783 System for using a two part cover for protecting a reticle Santiago del Puerto, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson +1 more 2005-06-14
6894261 Position measuring system for use in lithographic apparatus Thomas Josephus Maria Castenmiller, Andreas Ariens, Martinus Hendricus Hoeks, Patrick David Vogelsang, YimBun P. Kwan 2005-05-17
6879374 Device manufacturing method, device manufactured thereby and a mask for use in the method Jan Evert Van Der Werf, Hans Meiling, Johannes Hubertus Josephina Moors, Martinus Hendrikus Antonius Leenders 2005-04-12
6875992 Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method Thomas Josephus Maria Castenmiller, Andreas Ariens, Martinus Hendricus Hoeks, Patrick David Vogelsang, YimBun P. Kwan 2005-04-05
6870601 Lithographic apparatus and device manufacturing method Paulus Martinus Maria Liebregts, Arno Jan Bleeker, Harry Borggreve 2005-03-22
6853440 Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination Engelbertus A. F. van de Pasch, Marcel Hendrikus Maria Beems, Hendricus Johannes Maria Meijer, Daniel N. Galburt 2005-02-08