Issued Patents 2005
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6965427 | System to increase throughput in a dual substrate stage double exposure lithography system | Jos de Klerk | 2005-11-15 |
| 6950175 | System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism | Frederick Carter, Stephen Roux | 2005-09-27 |
| 6946761 | Actuator coil cooling system | — | 2005-09-20 |
| 6912043 | Removable reticle window and support frame using magnetic force | — | 2005-06-28 |
| 6906789 | Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion | Frederick Carter, Stephen Roux | 2005-06-14 |
| 6885435 | Method, system, and apparatus for management of reaction loads in a lithography system | — | 2005-04-26 |
| 6876439 | Method to increase throughput in a dual substrate stage double exposure lithography system | Jos de Klerk | 2005-04-05 |
| 6853440 | Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination | Engelbertus A. F. van de Pasch, Marcel Hendrikus Maria Beems, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra | 2005-02-08 |
| 6845287 | Method, system, and computer program product for improved trajectory planning and execution | Todd Bednarek | 2005-01-18 |