Issued Patents 2005
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6950175 | System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism | Daniel N. Galburt, Frederick Carter | 2005-09-27 |
| 6934005 | Reticle focus measurement method using multiple interferometric beams | Todd Bednarek | 2005-08-23 |
| 6927842 | Wafer handling method for use in lithography patterning | Santiago del Puerto, Justin Kreuzer | 2005-08-09 |
| 6919573 | Method and apparatus for recycling gases used in a lithography tool | — | 2005-07-19 |
| 6906789 | Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion | Frederick Carter, Daniel N. Galburt | 2005-06-14 |
| 6894293 | System for recycling gases used in a lithography tool | — | 2005-05-17 |
| 6850330 | Reticle focus measurement system using multiple interferometric beams | Todd Bednarek | 2005-02-01 |