Issued Patents 2005
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6927842 | Wafer handling method for use in lithography patterning | Santiago del Puerto, Stephen Roux | 2005-08-09 |
| 6917432 | Interferometers for measuring changes in optical beam direction | Henry A. Hill | 2005-07-12 |
| 6876440 | METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION | Arno Jan Bleeker, Wenceslao A. Cebuhar, Azat Latypov, Yuli Vladimirsky | 2005-04-05 |
| 6859260 | Method and system for improving focus accuracy in a lithography system | Michael L. Nelson, Peter L. Filosi, Christopher Mason | 2005-02-22 |