WC

Wenceslao A. Cebuhar

AN Asml Holding N.V.: 1 patents #21 of 56Top 40%
📍 Norwalk, CT: #12 of 49 inventorsTop 25%
🗺 Connecticut: #673 of 2,571 inventorsTop 30%
Overall (2005): #78,528 of 245,428Top 35%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6876440 METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION Arno Jan Bleeker, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky 2005-04-05