KO

Katsuya Okumura

KT Kabushiki Kaisha Toshiba: 16 patents #1 of 1,730Top 1%
EB Ebara: 2 patents #21 of 140Top 15%
SA Siemens Aktiengesellschaft: 2 patents #49 of 792Top 7%
TL Tokyo Electron Limited: 2 patents #16 of 216Top 8%
IBM: 2 patents #396 of 3,557Top 15%
📍 Tokyo, NY: #1 of 28 inventorsTop 4%
Overall (1997): #96 of 185,788Top 1%
17
Patents 1997

Issued Patents 1997

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
5702529 Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate and apparatus for making the same Yuuichi Mikata, Katsunori Ishihara 1997-12-30
5679610 Method of planarizing a semiconductor workpiece surface Tetsuo Matsuda 1997-10-21
5679484 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask Shinichi Ito, Haruo Okano, Toru Watanabe 1997-10-21
5660744 Plasma generating apparatus and surface processing apparatus Makoto Sekine, Keiji Horioka, Haruo Okano, Isahiro Hasegawa, Masaki Narita 1997-08-26
5660671 Magnetron plasma processing apparatus and processing method Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more 1997-08-26
5643056 Revolving drum polishing apparatus Masayoshi Hirose, Seiji Ishikawa, Norio Kimura, Yoshimi Sasaki, Kouki Yamada +2 more 1997-07-01
5639699 Focused ion beam deposition using TMCTS Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more 1997-06-17
5639308 Plasma apparatus Yuichiro Yamazaki, Motosuke Miyoshi 1997-06-17
5637153 Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus Reiji Niino, Yoshiyuki Fujita, Hideki Lee, Yasuo Imamura, Toshiharu Nishimura +4 more 1997-06-10
5636258 In-situ temperature measurement using X-ray diffraction James G. Ryan, Gregory Brian Stephenson, Hans-Joerg Timme 1997-06-03
5633207 Method of forming a wiring layer for a semiconductor device Hiroyuki Yano 1997-05-27
5620815 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask Shinichi Ito, Haruo Okano, Toru Watanabe 1997-04-15
5616063 Polishing apparatus Riichirou Aoki, Hiromi Yajima, Masako Kodera, Shirou Mishima, Atsushi Shigeta +3 more 1997-04-01
5611942 Method for producing tips for atomic force microscopes Tadashi Mitsui 1997-03-18
5609148 Method and apparatus for dicing semiconductor wafers Alexander Mitwalsky 1997-03-11
5605574 Semiconductor wafer support apparatus and method Yoshitaka Tsunashima 1997-02-25
5593537 Apparatus for processing semiconductor wafers William J. Cote, James Ryan, Hiroyuki Yano 1997-01-14