Issued Patents 1997
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698070 | Method of etching film formed on semiconductor wafer | Yoshihisa Hirano, Yoshifumi Tahara, Hiroshi Nishikawa, Isahiro Hasegawa | 1997-12-16 |
| 5660671 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Isahiro Hasegawa +3 more | 1997-08-26 |
| 5660744 | Plasma generating apparatus and surface processing apparatus | Makoto Sekine, Haruo Okano, Katsuya Okumura, Isahiro Hasegawa, Masaki Narita | 1997-08-26 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Mitsuyo Kariya, Soichi Inoue +7 more | 1997-06-17 |
| 5627626 | Projectin exposure apparatus | Soichi Inoue, Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi | 1997-05-06 |
| 5621498 | Projection exposure apparatus | Soichi Inoue, Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi | 1997-04-15 |
| 5607599 | Method of processing a magnetic thin film | Katsutaro Ichihara, Michiko Okubo | 1997-03-04 |