Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698070 | Method of etching film formed on semiconductor wafer | Yoshihisa Hirano, Yoshifumi Tahara, Hiroshi Nishikawa, Keiji Horioka | 1997-12-16 |
| 5667622 | In-situ wafer temperature control apparatus for single wafer tools | Karl Paul Muller, Bernhard L. Poschenriedes, Hans-Joerg Timme, Theodore G. van Kessel | 1997-09-16 |
| 5660671 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1997-08-26 |
| 5660744 | Plasma generating apparatus and surface processing apparatus | Makoto Sekine, Keiji Horioka, Haruo Okano, Katsuya Okumura, Masaki Narita | 1997-08-26 |