Issued Patents 1997
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5686151 | Method of forming a metal oxide film | Keitaro Imai, Masahiro Kiyotoshi | 1997-11-11 |
| 5679484 | Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask | Shinichi Ito, Toru Watanabe, Katsuya Okumura | 1997-10-21 |
| 5661345 | Semiconductor device having a single-crystal metal wiring | Junichi Wada, Hisashi Kaneko, Kyoichi Suguro, Nobuo Hayasaka | 1997-08-26 |
| 5660744 | Plasma generating apparatus and surface processing apparatus | Makoto Sekine, Keiji Horioka, Katsuya Okumura, Isahiro Hasegawa, Masaki Narita | 1997-08-26 |
| 5660671 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1997-08-26 |
| 5658389 | Thin film forming method and apparatus | Tetsuo Matsuda, Tokuhisa Ohiwa | 1997-08-19 |
| 5654237 | Method of manufacturing semiconductor device | Kyoichi Suguro | 1997-08-05 |
| 5641581 | Semiconductor device | Yukio Nishiyama, Rempei Nakata, Nobuo Hayasaka, Riichirou Aoki, Takahito Nagamatsu +3 more | 1997-06-24 |
| 5641702 | Method of making semiconductor integrated-circuit capacitor | Keitaro Imai, Tomonori Aoyama, Yasunori Okayama | 1997-06-24 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more | 1997-06-17 |
| 5620815 | Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask | Shinichi Ito, Toru Watanabe, Katsuya Okumura | 1997-04-15 |
| 5607718 | Polishing method and polishing apparatus | Yasutaka Sasaki, Mie Matsuo, Rempei Nakata, Junichi Wada, Nobuo Hayasaka +1 more | 1997-03-04 |
| 5597341 | Semiconductor planarizing apparatus | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Hiromi Yajima | 1997-01-28 |
| 5591486 | Method for forming a film on a substrate by activating a reactive gas | Sadahisa Noguchi, Makoto Sekine | 1997-01-07 |