Issued Patents 1997
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5686209 | Phase shifting mask and method of forming a pattern using the same | Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Hiroyuki Sato +2 more | 1997-11-11 |
| 5673103 | Exposure apparatus and method | Satoshi Tanaka, Tadahito Fujisawa | 1997-09-30 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more | 1997-06-17 |
| 5633713 | Method and system for evaluating distribution of absorption light amount in optical lithography | Satoshi Tanaka | 1997-05-27 |
| 5627626 | Projectin exposure apparatus | Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi, Keiji Horioka | 1997-05-06 |
| 5621498 | Projection exposure apparatus | Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi, Keiji Horioka | 1997-04-15 |
| 5609977 | Reflection phase shifting mask and method of forming a pattern using the same | Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Hiroyuki Sato +2 more | 1997-03-11 |