Issued Patents All Time
Showing 26–50 of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9091916 | Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal | Takahiro Shimizu, Yasushi Washio, Yasushi Kuroiwa, Takayoshi Mori | 2015-07-28 |
| 9091915 | Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound | Daichi Takaki, Masatoshi Arai | 2015-07-28 |
| 9075304 | Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern | Masatoshi Arai | 2015-07-07 |
| 9063416 | Resist composition, method of forming resist pattern and compound | Yoshitaka Komuro, Akiya Kawaue, Toshiaki Hato | 2015-06-23 |
| 9045398 | Sulfonium salt and photo-acid generator | Issei Suzuki, Takuya Ikeda, Yusaku Takashima, Takeshi Furuta, Yoshitaka Komuro +2 more | 2015-06-02 |
| 9040220 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita +2 more | 2015-05-26 |
| 9034556 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita +2 more | 2015-05-19 |
| 9023581 | Resist composition, method of forming resist pattern, polymeric compound, and compound | Akiya Kawaue, Kazushige Dohtani, Jun Iwashita, Kenri Konno, Daiju Shiono +1 more | 2015-05-05 |
| 9017924 | Resist composition, method of forming resist pattern, polymeric compound and compound | Daichi Takaki | 2015-04-28 |
| 9017919 | Resist composition, method of forming resist pattern, novel compound and acid generator | Akiya Kawaue, Yoshitaka Komuro, Kenichiro Miyashita | 2015-04-28 |
| 9012129 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Hideo Hada, Takehiro Seshimo, Akiya Kawaue | 2015-04-21 |
| 9005874 | Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern | Yoshitaka Komuro, Akiya Kawaue, Masatoshi Arai | 2015-04-14 |
| 8987386 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | Takahiro Dazai, Masatoshi Arai, Takaaki Kaiho | 2015-03-24 |
| 8932795 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Takehiro Seshimo, Kazushige Dohtani | 2015-01-13 |
| 8900795 | Resist composition, method of forming resist pattern and novel compound | Hiroaki Shimizu, Jiro Yokoya | 2014-12-02 |
| 8900788 | Resist composition for immersion exposure and method of forming resist pattern | Yasuhiro Yoshii | 2014-12-02 |
| 8846291 | Resist composition, method of forming resist pattern, and new compound | Kenichiro Miyashita, Akiya Kawaue | 2014-09-30 |
| 8808959 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Hideo Hada, Takehiro Seshimo, Akiya Kawaue | 2014-08-19 |
| 8778595 | Resist composition, method of forming resist pattern, and polymeric compound | Daichi Takaki, Daiju Shiono, Jun Iwashita | 2014-07-15 |
| 8765352 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Takehiro Seshimo | 2014-07-01 |
| 8765354 | Resist composition for negative development and method of forming resist pattern | Hiroaki Shimizu | 2014-07-01 |
| 8703387 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Akiya Kawaue | 2014-04-22 |
| 8685620 | Resist composition, method of forming resist pattern and polymeric compound | Daichi Takaki, Daiju Shiono, Takaaki Kaiho | 2014-04-01 |
| 8614049 | Resist composition and method of forming resist pattern | Masaru Takeshita, Hiroaki Shimizu, Syo Abe, Yoshitaka Komuro | 2013-12-24 |
| 8609320 | Resist composition, method of forming resist pattern, polymeric compound and compound | Takehiro Seshimo, Tomoyuki Hirano, Daichi Takaki, Junichi Tsuchiya | 2013-12-17 |