TT

Takashi Takekuma

TL Tokyo Electron Limited: 18 patents #330 of 5,567Top 6%
TL Tokyo Electron Kyushu Limited: 9 patents #4 of 104Top 4%
IC Iwaki Co.: 1 patents #24 of 53Top 50%
TL Tel Kyushu Limited: 1 patents #9 of 17Top 55%
📍 Yamaga, TX: #1 of 1 inventorsTop 100%
Overall (All Time): #259,152 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
7485188 Coating process method and coating process apparatus Yasuyuki Kometani, Yoshiteru Fukuda, Junya Minamida 2009-02-03
6848625 Process liquid supply mechanism and process liquid supply method Toshinobu Furusho, Takeshi Ohto, Hiroyuki Miyamoto, Kousuke Yoshihara, Shinya Hori +1 more 2005-02-01
6527861 Developing apparatus with a porous film nozzle 2003-03-04
6432199 Apparatus and method for processing a substrate 2002-08-13
6402400 Substrate processing apparatus Issei Ueda, Kenji Okumura 2002-06-11
6377329 Substrate processing apparatus 2002-04-23
6284043 Solution treatment apparatus 2001-09-04
6258167 Process liquid film forming apparatus Yukihiro Kawano 2001-07-10
6054181 Method of substrate processing to form a film on multiple target objects Mitsuhiro Nanbu, Naruaki Iida, Hideaki Gotou, Masanori Tateyama, Yuji Yoshimoto +6 more 2000-04-25
5964954 Double-sided substrate cleaning apparatus and cleaning method using the same Hiroyuki Matsukawa, Akira Yonemizu, Michiaki Matsushita, Akihiro Fujimoto, Hidetami Yaegashi +1 more 1999-10-12
5725664 Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections Mitsuhiro Nanbu, Naruaki Iida, Hideaki Gotou, Masanori Tateyama, Yuji Yoshimoto +6 more 1998-03-10
5686143 Resist treating method Hiroyuki Matsukawa, Akira Yonemizu, Michiaki Matsushita, Akihiro Fujimoto, Hidetami Yaegashi +1 more 1997-11-11
5665200 Substrate processing method and substrate processing apparatus Akihiro Fujimoto, Kiyomi Sonobe 1997-09-09
5580607 Coating apparatus and method Masaaki Murakami, Masatoshi Deguchi, Akihiro Fujimoto 1996-12-03
5565034 Apparatus for processing substrates having a film formed on a surface of the substrate Mitsuhiro Nanbu, Naruaki Iida, Hideaki Gotou, Masanori Tateyama, Yuji Yoshimoto +6 more 1996-10-15
5518542 Double-sided substrate cleaning apparatus Hiroyuki Matsukawa, Akira Yonemizu, Michiaki Matsushita, Akihiro Fujimoto, Hidetami Yaegashi +1 more 1996-05-21
5416047 Method for applying process solution to substrates Nobuo Konishi, Hideyuki Takamori, Masami Akimoto, Kiyohisa Tateyama, Masaaki Murakami +1 more 1995-05-16
5070813 Coating apparatus Hiroyuki Sakai, Eiichi Shirakawa, Chizo Yamaguchi 1991-12-10