RC

Robert D. Clark

TL Tokyo Electron Limited: 82 patents #17 of 5,567Top 1%
Air Products And Chemicals: 4 patents #485 of 1,997Top 25%
TR Tripos: 4 patents #1 of 20Top 5%
TL Toyko Electron Limited: 1 patents #1 of 31Top 4%
IBM: 1 patents #44,794 of 70,183Top 65%
📍 Fremont, CA: #76 of 9,298 inventorsTop 1%
🗺 California: #2,363 of 386,348 inventorsTop 1%
Overall (All Time): #15,238 of 4,157,543Top 1%
97
Patents All Time

Issued Patents All Time

Showing 26–50 of 97 patents

Patent #TitleCo-InventorsDate
11101173 Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same Jeffrey Smith, Kandabara Tapily, Angelique Raley, Qiang Zhao 2021-08-24
11024535 Method for filling recessed features in semiconductor devices with a low-resistivity metal Kai-Hung Yu, David L. O'Meara, Nicholas Joy, Gyanaranjan Pattanaik, Kandabara Tapily +3 more 2021-06-01
10964608 Platform and method of operating for integrated end-to-end gate contact process 2021-03-30
10923394 Platform and method of operating for integrated end-to-end fully self-aligned interconnect process Kandabara Tapily, Kai-Hung Yu 2021-02-16
10923392 Interconnect structure and method of forming the same Soo Doo Chae, Jeffrey Smith, Gerrit J. Leusink, Kai-Hung Yu 2021-02-16
10916472 Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same Jeffrey Smith, Kandabara Tapily, Angelique Raley, Qiang Zhao 2021-02-09
10886173 Platform and method of operating for integrated end-to-end fully self-aligned interconnect process Kandabara Tapily, Kai-Hung Yu 2021-01-05
10861744 Platform and method of operating for integrated end-to-end CMP-less interconnect process Ying Trickett, Kai-Hung Yu, Nicholas Joy, Kaoru Maekawa 2020-12-08
10790156 Atomic layer etching using a boron-containing gas and hydrogen fluoride gas Kandabara Tapily 2020-09-29
10790149 Method of forming crystallographically stabilized ferroelectric hafnium zirconium based films for semiconductor devices Kandabara Tapily 2020-09-29
10784175 Platform and method of operating for integrated end-to-end gate contact process 2020-09-22
10727057 Platform and method of operating for integrated end-to-end self-aligned multi-patterning process Richard A. Farrell, Kandabara Tapily, Angelique Raley, Sophie Thibaut 2020-07-28
10541174 Interconnect structure and method of forming the same Soo Doo Chae, Jeffrey Smith, Gerrit J. Leusink, Kai-Hung Yu 2020-01-21
10522343 Method of enhancing high-k film nucleation rate and electrical mobility in a semiconductor device by microwave plasma treatment Kandabara Tapily 2019-12-31
10483109 Self-aligned spacer formation Kandabara Tapily 2019-11-19
10426001 Processing system for electromagnetic wave treatment of a substrate at microwave frequencies Ronald Nasman, Mirko Vukovic, Gerrit J. Leusink, Rodney L. Robison 2019-09-24
10381448 Wrap-around contact integration scheme Kandabara Tapily 2019-08-13
10283369 Atomic layer etching using a boron-containing gas and hydrogen fluoride gas Kandabara Tapily 2019-05-07
10253414 Liquid phase atomic layer deposition 2019-04-09
10217825 Metal-insulator-semiconductor (MIS) contacts and method of forming Kandabara Tapily 2019-02-26
10014213 Selective bottom-up metal feature filling for interconnects Kai-Hung Yu, Kandabara Tapily, Gerrit J. Leusink 2018-07-03
9978649 Solid source doping for source and drain extension doping Steven P. Consiglio, Jeffrey Smith 2018-05-22
9899224 Method of controlling solid phase diffusion of boron dopants to form ultra-shallow doping regions Steven P. Consiglio, David L. O'Meara 2018-02-20
9837304 Sidewall protection scheme for contact formation Kandabara Tapily 2017-12-05
9607829 Method of surface functionalization for high-K deposition Kandabara Tapily 2017-03-28