Issued Patents All Time
Showing 126–150 of 364 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11652141 | Strained nanowire CMOS device and method of forming | Cheng-Yi Peng, Hung-Li Chiang, Yu-Lin Yang, Chih Chieh Yeh, Chi-Wen Liu | 2023-05-16 |
| 11652105 | Epitaxy regions with large landing areas for contact plugs | Jung-Chi Tai, Yi-Fang Pai, Tsz-Mei Kwok, Tsung-Hsi Yang, Jeng-Wei Yu +5 more | 2023-05-16 |
| 11652053 | Semiconductor device and method for forming the same | Kuo-Ju Chen, Chun-Hsien Huang, Su-Hao Liu, Liang-Yin Chen, Huicheng Chang | 2023-05-16 |
| 11646377 | Semiconductor device and method of manufacture | Wei-Ting Chien, Su-Hao Liu, Liang-Yin Chen, Huicheng Chang | 2023-05-09 |
| 11615982 | Reducing spacing between conductive features through implantation | Kuo-Ju Chen, Su-Hao Liu, Liang-Yin Chen, Huicheng Chang, Meng-Han Chou | 2023-03-28 |
| 11605635 | Semiconductor device and method of forming same | Szu-Ying Chen, Sen-Hong Syue, Li-Ting Wang, Huicheng Chang | 2023-03-14 |
| 11605555 | Trench filling through reflowing filling material | Wen-Yen Chen, Li-Ting Wang, Wan-Chen Hsieh, Bo-Cyuan Lu, Tai-Chun Huang +1 more | 2023-03-14 |
| 11600534 | Source/drain structures and method of forming | Wei-Min Liu, Hsueh-Chang Sung, Li-Li Su | 2023-03-07 |
| 11581425 | Method for manufacturing semiconductor structure with enlarged volumes of source-drain regions | Tsung-Hsi Yang, Che-Yu Lin, Yi-Fang Pai, Pei-Ren Jeng, Chii-Horng Li | 2023-02-14 |
| 11575026 | Source/drain structure for semiconductor device | Chien-Wei Lee, Chii-Horng Li, Heng-Wen Ting, Yen-Ru Lee, Chih-Yun Chin +2 more | 2023-02-07 |
| 11569236 | Replacement gate process for FinFET | Hung-Li Chiang, Cheng-Yi Peng, Tsung-Yao Wen, Yen-Ming Chen | 2023-01-31 |
| 11569084 | Method for manufacturing semiconductor structure with reduced nodule defects | Che-Yu Lin, Chih-Chiang Chang, Chien-Hung Chen, Ming-Hua Yu, Tsung-Hsi Yang +2 more | 2023-01-31 |
| 11563110 | Semiconductor structure and method for forming the same | Yi-Yun Li, Tsai-Yu Huang, Huicheng Chang | 2023-01-24 |
| 11532516 | Melting laser anneal of epitaxy regions | Su-Hao Liu, Wen-Yen Chen, Tz-Shian Chen, Cheng-Jung Sung, Li-Ting Wang +3 more | 2022-12-20 |
| 11532750 | Semiconductor device and method of manufacture | Li-Li Su, Wei-Min Liu, Wei Hao Lu, Chien-I Kuo | 2022-12-20 |
| 11527650 | FinFET device having a source/drain region with a multi-sloped undersurface | Wei-Min Liu, Li-Li Su | 2022-12-13 |
| 11527442 | Fin field-effect transistor device and method of forming the same | Che-Yu Lin, Chien-Wei Lee, Chien-Hung Chen, Wen-Chu Hsiao | 2022-12-13 |
| 11502000 | Bottom lateral expansion of contact plugs through implantation | Meng-Han Chou, Su-Hao Liu, Kuo-Ju Chen, Liang-Yin Chen, Huicheng Chang | 2022-11-15 |
| 11456383 | Semiconductor device having a contact plug with an air gap spacer | Su-Hao Liu, Kuo-Ju Chen, Kai-Hsuan Lee, I-Hsieh Wong, Cheng-Yu Yang +4 more | 2022-09-27 |
| 11450743 | Method of forming a semiconductor device with implantation of impurities at high temperature | Bau-Ming Wang, Che-Fu Chiu, Chun-Feng Nieh, Huicheng Chang | 2022-09-20 |
| 11450565 | Ion implant process for defect elimination in metal layer planarization | Chia-Cheng Chen, Huicheng Chang, Fu-Ming Huang, Kei-Wei Chen, Liang-Yin Chen +3 more | 2022-09-20 |
| 11437497 | Semiconductor device and method | Ji-Yin Tsai, Jung-Jen Chen, Pei-Ren Jeng, Chii-Horng Li, Kei-Wei Chen | 2022-09-06 |
| 11410996 | Field-effect transistors having transition metal dichalcogenide channels and methods of manufacture | Ling-Yen Yeh, Yuan-Chen Sun | 2022-08-09 |
| 11393695 | Ion exposure method and apparatus | Chia-Cheng Chen, Wei-Ting Chien, Liang-Yin Chen, Huicheng Chang | 2022-07-19 |
| 11380782 | Variable size fin structures | Su-Hao Liu, Huicheng Chang, Chien-Tai Chan, Liang-Yin Chen, Szu-Ying Chen | 2022-07-05 |