JT

Ji-Yin Tsai

TSMC: 13 patents #2,298 of 12,232Top 20%
📍 Dashulong, TW: #168 of 596 inventorsTop 30%
Overall (All Time): #361,820 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
12324190 Method and multi-channel devices with anti-punch-through features Min Jiao, Da-Wen Lin, Hung-Ju Chou 2025-06-03
12255102 Methods of forming of inner spacer structure using semiconductor material with variable germanium concentration Che-Lun Chang, Jiun-Ming Kuo, Yuan-Ching Peng 2025-03-18
12159925 Semiconductor device and method Jung-Jen Chen, Pei-Ren Jeng, Chii-Horng Li, Kei-Wei Chen, Yee-Chia Yeo 2024-12-03
12068395 Method for forming an undoped region under a source/drain Meng-Ku Chen, Jeng-Wei Yu, Yi-Fang Pai, Pei-Ren Jeng, Yee-Chia Yeo +1 more 2024-08-20
11862709 Inner spacer structure and methods of forming such Che-Lun Chang, Jiun-Ming Kuo, Yuan-Ching Peng 2024-01-02
11616133 Fin field-effect transistor device and method Che-Lun Chang, Shiao-Shin Cheng, Yu-Lin Tsai, Hsin-Chieh Huang, Ming-Yuan Wu +4 more 2023-03-28
11437497 Semiconductor device and method Jung-Jen Chen, Pei-Ren Jeng, Chii-Horng Li, Kei-Wei Chen, Yee-Chia Yeo 2022-09-06
11316030 Fin field-effect transistor device and method Che-Lun Chang, Shiao-Shin Cheng, Yu-Lin Tsai, Hsin-Chieh Huang, Ming-Yuan Wu +4 more 2022-04-26
9887290 Silicon germanium source/drain regions Yao-Tsung Huang, Chih-Hsin Ko, Clement Hsingjen Wann 2018-02-06
8962400 In-situ doping of arsenic for source and drain epitaxy Yao-Tsung Huang, Chih-Hsin Ko, Clement Hsingjen Wann 2015-02-24
8878302 Semiconductor device having SiGe substrate, interfacial layer and high K dielectric layer Chao-Ching Cheng, Cheng-Hsien Wu, Chih-Hsin Ko, Clement Hsingjen Wann 2014-11-04
8866188 Semiconductor devices and methods of manufacture thereof Yao-Tsung Huang, Chih-Hsin Ko, Clement Hsingjen Wann 2014-10-21
8785285 Semiconductor devices and methods of manufacture thereof Yao-Tsung Huang, Chih-Hsin Ko, Clement Hsingjen Wann 2014-07-22