Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12283515 | Method and device to reduce epitaxial defects due to contact stress upon a semicondcutor wafer | Sih-Jie Liu, Che-Fu Chiu, Chun-Feng Nieh, Huicheng Chang, Yee-Chia Yeo | 2025-04-22 |
| 12211901 | Semiconductor device having a doped fin well | Che-Fu Chiu, Chun-Feng Nieh, Huicheng Chang, Yee-Chia Yeo | 2025-01-28 |
| 12087841 | Method of manufacturing gate spacers with stepped sidewalls by removing vertical portions of a helmet layer | Yi-Lun Chen, Chun-Hsiung Lin | 2024-09-10 |
| 11450743 | Method of forming a semiconductor device with implantation of impurities at high temperature | Che-Fu Chiu, Chun-Feng Nieh, Huicheng Chang, Yee-Chia Yeo | 2022-09-20 |
| 11374108 | Fin semiconductor device having a stepped gate spacer sidewall | Yi-Lun Chen, Chun-Hsiung Lin | 2022-06-28 |
| 10741667 | Method of manufacturing a protective stack on a semiconductor fin | Yi-Lun Chen, Chun-Hsiung Lin | 2020-08-11 |
| 8906778 | Method of semiconductor manufacturing process | YewChung Sermon Wu, Feng-Ching Hsiao | 2014-12-09 |