Issued Patents All Time
Showing 251–264 of 264 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9360767 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Chih-Ming Ke, Fu-Jye Liang, Tzung-Chi Fu | 2016-06-07 |
| 9158209 | Method of overlay prediction | Fu-Jye Liang, Hung-Chang Hsieh | 2015-10-13 |
| 9025130 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Fu-Jye Liang, Tzung-Chi Fu, Chih-Ming Ke | 2015-05-05 |
| 8946095 | Method of forming interlayer dielectric film above metal gate of semiconductor device | Jyh-Nan Lin, Chin-Feng Sun, Po-Hsiung Leu, Ding-I Liu | 2015-02-03 |
| 8592107 | Method and apparatus of providing overlay | Guo-Tsai Huang, Fu-Jye Liang, Chih-Ming Ke | 2013-11-26 |
| 8329360 | Method and apparatus of providing overlay | Guo-Tsai Huang, Fu-Jye Liang, Chih-Ming Ke | 2012-12-11 |
| 8264662 | In-line particle detection for immersion lithography | Tsai-Sheng Gau, Chi-Kang Peng | 2012-09-11 |
| 7751025 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Chih-Ming Ke, Bang-Ching Ho, Jen-Chieh Shih, Tsai-Sheng Gau | 2010-07-06 |
| 7675604 | Hood for immersion lithography | Tzung-Chi Fu, Ching-Yu Chang, Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen +1 more | 2010-03-09 |
| 7338909 | Micro-etching method to replicate alignment marks for semiconductor wafer photolithography | Yu-Liang Lin, Henry Lo, Chung-Long Chang, Gorge Huang, Tony Lu +8 more | 2008-03-04 |
| 7135259 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Chih-Ming Ke, Bang-Ching Ho, Jen-Chieh Shih, Tsai-Sheng Gau | 2006-11-14 |
| 6973636 | Method of defining forbidden pitches for a lithography exposure tool | Jaw-Jung Shin, Chun-Kuang Chen, Tsai-Sheng Gau, Burn Jeng Lin, Li-Chun Tien +4 more | 2005-12-06 |
| 6768555 | Fabry-Perot filter apparatus with enhanced optical discrimination | Ran Lin | 2004-07-27 |
| 6744058 | Geometric compensation method for charged particle beam irradiation | Tsai-Sheng Gau | 2004-06-01 |