Issued Patents All Time
Showing 151–175 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10866511 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2020-12-15 |
| 10866517 | Lithography techniques for reducing resist swelling | Ming-Hui Weng, Cheng-Han Wu, Chin-Hsiang Lin | 2020-12-15 |
| 10863630 | Material composition and methods thereof | Siao-Shan Wang, Cheng-Han Wu, Chin-Hsiang Lin | 2020-12-08 |
| 10859915 | Adhesion layer for multi-layer photoresist | Chen-Yu Liu, Tzu-Yang Lin, Ya-Ching Chang, Chin-Hsiang Lin | 2020-12-08 |
| 10840066 | Adjustable fastening device for plasma gas injectors | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2020-11-17 |
| 10838304 | Priming material for organometallic resist | Chun-Chih HO, An-Ren Zi | 2020-11-17 |
| 10802402 | Material composition and process for substrate modification | Wei-Han Lai, Chien-Wei Wang, Chin-Hsiang Lin | 2020-10-13 |
| 10796910 | Method for performing a photolithography process | Tsung-Han Ko, Joy Cheng, Chin-Hsiang Lin | 2020-10-06 |
| 10777681 | Multi-layer photoresist | An-Ren Zi, Chin-Hsiang Lin | 2020-09-15 |
| 10770293 | Method for manufacturing a semiconductor device | Yu-Chung Su, Yahru Cheng | 2020-09-08 |
| 10768527 | Resist solvents for photolithography applications | Yu-Chung Su, Kuan-Hsin Lo, Yahru Cheng, Chin-Hsiang Lin | 2020-09-08 |
| 10755927 | Anti-reflective gap filling materials and methods | Yu-Chung Su | 2020-08-25 |
| 10747114 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Siao-Shan Wang, Chen-Yu Liu, Chin-Hsiang Lin | 2020-08-18 |
| 10741410 | Material composition and methods thereof | An-Ren Zi, Joy Cheng | 2020-08-11 |
| 10741391 | Method for forming semiconductor structure by patterning resist layer having inorganic material | An-Ren Zi, Chin-Hsiang Lin | 2020-08-11 |
| 10739673 | Preparing patterned neutral layers and structures prepared using the same | Kuan-Hsin Lo | 2020-08-11 |
| 10727045 | Method for manufacturing a semiconductor device | Wan-Lin Tsai, Jung-Hau Shiu, Jen Hung Wang, Shing-Chyang Pan, Tze-Liang Lee | 2020-07-28 |
| 10698317 | Underlayer material for photoresist | An-Ren Zi, Wei-Han Lai | 2020-06-30 |
| 10691023 | Method for performing lithography process with post treatment | Ming-Hui Weng, Chin-Hsiang Lin | 2020-06-23 |
| 10684545 | Method for forming semiconductor structure by patterning assist layer having polymer | An-Ren Zi, Chin-Hsiang Lin | 2020-06-16 |
| 10672619 | Material composition and methods thereof | Siao-Shan Wang, Cheng-Han Wu, Chin-Hsiang Lin | 2020-06-02 |
| 10672610 | Grafting design for pattern post-treatment in semiconductor manufacturing | Siao-Shan Wang, Chin-Hsiang Lin | 2020-06-02 |
| 10658191 | Conformal middle layer for a lithography process | Chen-Yu Liu, Ming-Huei Weng | 2020-05-19 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Chih-Yuan Ting +7 more | 2020-05-19 |
| 10655210 | Roll-to-roll sputtering process with hybrid target and product thereof | Chien-Fa Liao | 2020-05-19 |