Issued Patents All Time
Showing 176–200 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10655019 | Priming material for substrate coating | Ya-Ling Cheng | 2020-05-19 |
| 10649339 | Resist material and method for forming semiconductor structure using resist layer | Ya-Ching Chang, Chen-Yu Liu, Cheng-Han Wu, Chin-Hsiang Lin | 2020-05-12 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2020-04-28 |
| 10622211 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Joy Cheng | 2020-04-14 |
| 10573519 | Method for performing a photolithography process | Tsung-Han Ko, Joy Cheng, Chin-Hsiang Lin | 2020-02-25 |
| 10539878 | Lithography patterning technique | Lilin Chang | 2020-01-21 |
| 10529552 | Method for manufacturing a semiconductor device and a coating material | Yu Ling Chien, Chien-Chih Chen, Chin-Hsiang Lin, Yahru Cheng | 2020-01-07 |
| 10527941 | Extreme ultraviolet photoresist and method | Chen-Yu Liu, Ya-Ching Chang, Cheng-Han Wu, Chin-Hsiang Lin | 2020-01-07 |
| 10520820 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Wei-Han Lai, Tzu-Yang Lin, Ming-Hui Weng, Chin-Hsiang Lin | 2019-12-31 |
| 10520821 | Lithography process with enhanced etch selectivity | Chen-Yu Liu, Chin-Hsiang Lin | 2019-12-31 |
| 10520822 | Lithography techniques for reducing resist swelling | Ming-Hui Weng, Cheng-Han Wu, Chin-Hsiang Lin | 2019-12-31 |
| 10520833 | Extreme ultraviolet lithography system | Ming-Hui Weng, Cheng-Han Wu, Chin-Hsiang Lin | 2019-12-31 |
| 10520836 | Immersion lithography system using a sealed wafer bath | Burn Jeng Lin | 2019-12-31 |
| 10515847 | Method for forming vias and method for forming contacts in vias | Tzu-Yang Lin, Cheng-Han Wu, Chin-Hsiang Lin | 2019-12-24 |
| 10517179 | Material composition and methods thereof | Siao-Shan Wang, Cheng-Han Wu, Chin-Hsiang Lin | 2019-12-24 |
| 10515812 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Joy Cheng, Chin-Hsiang Lin | 2019-12-24 |
| 10514603 | Photoresist and method | Wei-Han Lai, Chen-Hau Wu | 2019-12-24 |
| 10503070 | Photosensitive material and method of lithography | An-Ren Zi, Chien-Wei Wang | 2019-12-10 |
| 10466593 | Method and apparatus of patterning a semiconductor device | An-Ren Zi | 2019-11-05 |
| 10421867 | Priming material for substrate coating | Chen-Yu Liu | 2019-09-24 |
| 10424543 | Overlay mark | Chen Chen, Ming-Feng Shieh | 2019-09-24 |
| 10394123 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Siao-Shan Wang, Chen-Yu Liu, Chin-Hsiang Lin | 2019-08-27 |
| 10394126 | Photolithography process and materials | Ya-Ling Cheng, Chien-Wei Wang, Yen-Hao Chen | 2019-08-27 |
| 10381481 | Multi-layer photoresist | An-Ren Zi, Chin-Hsiang Lin | 2019-08-13 |
| 10365561 | Photoresist and method | Wei-Han Lai, Chen-Hau Wu | 2019-07-30 |