Issued Patents All Time
Showing 226–250 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10007177 | Method to define multiple layer patterns using double exposures | Ming-Huei Weng, Chun-Kuang Chen | 2018-06-26 |
| 9989850 | Photoresist system and method | Chen-Hau Wu | 2018-06-05 |
| 9978594 | Formation method of semiconductor device structure using patterning stacks | Li-Yen Lin, Kuei-Shun Chen, Chin-Hsiang Lin | 2018-05-22 |
| 9958779 | Photoresist additive for outgassing reduction and out-of-band radiation absorption | Wei-Han Lai, Chien-Wei Wang | 2018-05-01 |
| 9941157 | Porogen bonded gap filling material in semiconductor manufacturing | Bo-Jiun Lin, Hai-Ching Chen, Tien-I Bao | 2018-04-10 |
| 9927707 | Developer for lithography | Chen-Yu Liu, Chin-Hsiang Lin | 2018-03-27 |
| 9921480 | Extreme ultraviolet photoresist | Wei-Han Lai, Chien-Wei Wang | 2018-03-20 |
| 9904163 | Cut-mask patterning process for FIN-like field effect transistor (FINFET) device | Wei-De Ho, Kuei-Liang Lu, Ming-Feng Shieh | 2018-02-27 |
| 9906634 | Communication method for a smart phone with a text recognition module | Chi-Wen Liu, Kuo-Ching CHIANG | 2018-02-27 |
| 9905457 | High boiling temperature solvent additives for semiconductor processing | Bo-Jiun Lin, Hai-Ching Chen, Tien-I Bao | 2018-02-27 |
| 9891522 | Method and composition of a chemically amplified copolymer resist | Ya-Ling Cheng | 2018-02-13 |
| 9891528 | Extreme ultraviolet lithography with reduced exposure dose and negative tone development | Chen-Yu Liu | 2018-02-13 |
| 9892914 | Orientation layer for directed self-assembly patterning process | Tsung-Han Ko, Kuan-Hsin Lo | 2018-02-13 |
| 9864275 | Lithographic resist with floating protectant | Chien-Wei Wang, Hsueh-An Chen | 2018-01-09 |
| 9857684 | Silicon-containing photoresist for lithography | Li-Yen Lin | 2018-01-02 |
| 9851636 | Materials and methods for improved photoresist performance | Chen-Yu Liu | 2017-12-26 |
| 9810990 | Chemical treatment for lithography improvement in a negative tone development process | Wei-Han Lai, Cheng-Han Wu, Siao-Shan Wang, Chin-Hsiang Lin | 2017-11-07 |
| 9772559 | Patterned photoresist removal | Ya-Ling Cheng, Chien-Chih Chen | 2017-09-26 |
| 9768022 | Advanced cross-linkable layer over a substrate | Ming-Huei Weng, Chen-Yu Liu | 2017-09-19 |
| 9761449 | Gap filling materials and methods | Yu-Chung Su | 2017-09-12 |
| 9731231 | Laminar flow intake channeling device | Ya-Ling Cheng | 2017-08-15 |
| 9735047 | Semiconductor device and method for fabricating the same | Ssu-I Fu, Yu-Hsiang Hung, Chih-Kai Hsu, Wei-Chi Cheng, Jyh-Shyang Jenq | 2017-08-15 |
| 9728469 | Methods for forming a stress-relieved film stack by applying cutting patterns | Wen-Yun Wang | 2017-08-08 |
| 9704711 | Silicon-based middle layer composition | Chen-Yu Liu | 2017-07-11 |
| 9696634 | Immersion lithography system using a sealed wafer bath | Burn Jeng Lin | 2017-07-04 |