Issued Patents All Time
Showing 276–300 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9261786 | Photosensitive material and method of photolithography | — | 2016-02-16 |
| 9256133 | Apparatus and method for developing process | — | 2016-02-09 |
| 9256128 | Method for manufacturing semiconductor device | Chen-Yu Liu | 2016-02-09 |
| 9245751 | Anti-reflective layer and method | Yu-Chung Su, Wen-Yun Wang | 2016-01-26 |
| 9239520 | Photoresist defect reduction system and method | Wen-Yun Wang | 2016-01-19 |
| 9236267 | Cut-mask patterning process for fin-like field effect transistor (FinFET) device | Ho Wei De, Kuei-Liang Lu, Ming-Feng Shieh | 2016-01-12 |
| 9223220 | Photo resist baking in lithography process | — | 2015-12-29 |
| 9213234 | Photosensitive material and method of lithography | — | 2015-12-15 |
| 9175173 | Unlocking layer and method | Chen-Yu Liu | 2015-11-03 |
| 9162188 | Methods for cleaning membranes used for filtering chemicals | Ya-Ling Cheng | 2015-10-20 |
| 9152046 | Photo-resist with floating acid | Ming-Feng Shieh, Wen-Hung Tseng | 2015-10-06 |
| 9146469 | Middle layer composition for trilayer patterning stack | Chen-Yu Liu | 2015-09-29 |
| 9123662 | Reducing defects in patterning processes | — | 2015-09-01 |
| 9122164 | Lithography material and lithography process | — | 2015-09-01 |
| 9046789 | Immersion lithography system using a sealed wafer bath | Burn Jeng Lin | 2015-06-02 |
| 9046785 | Method and apparatus of patterning a semiconductor device | Chien-Wei Wang, Ming-Feng Shieh | 2015-06-02 |
| 9017934 | Photoresist defect reduction system and method | Wen-Yun Wang | 2015-04-28 |
| 9012132 | Coating material and method for photolithography | — | 2015-04-21 |
| 9005881 | Method of lithography | Fong-Cheng Lee | 2015-04-14 |
| 8956806 | Photoresist and patterning process | Chien-Wei Wang, Burn Jeng Lin | 2015-02-17 |
| 8953103 | Projector embedded into a portable communication device | Kuo-Ching CHIANG, Chi-Wen Liu | 2015-02-10 |
| 8936903 | Photo-resist with floating acid | Ming-Feng Shieh, Wen-Hung Tseng | 2015-01-20 |
| 8932799 | Photoresist system and method | Chen-Hau Wu | 2015-01-13 |
| 8908181 | Overlay mark and method of measuring the same | Chen Chen, Ming-Feng Shieh | 2014-12-09 |
| 8895234 | Immersion lithography watermark reduction | Vincent Yu | 2014-11-25 |