Issued Patents All Time
Showing 301–325 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8852420 | Method for calibrating test meter by biosensor test strip | Hung-Ping Liu | 2014-10-07 |
| 8848163 | Photoresist materials and photolithography processes | Hsien-Cheng Wang, Chin-Hsiang Lin, Heng-Jen Lee, Hua-Tai Lin, Burn Jeng Lin | 2014-09-30 |
| 8841066 | Photoresist stripping technique | Chien-Wei Wang | 2014-09-23 |
| 8841058 | Photolithography material for immersion lithography processes | — | 2014-09-23 |
| 8822347 | Wet soluble lithography | Chien-Wei Wang | 2014-09-02 |
| 8802569 | Method of fabricating a semiconductor device | Kuei-Liang Lu, Ming-Feng Shieh | 2014-08-12 |
| 8802354 | Water mark defect prevention for immersion lithography | — | 2014-08-12 |
| 8795540 | Selective bias compensation for patterning steps in CMOS processes | Ming-Feng Shieh | 2014-08-05 |
| 8767178 | Immersion lithography system using direction-controlling fluid inlets | Burn Jeng Lin | 2014-07-01 |
| 8753797 | Surface-modified middle layers | Fang Lin | 2014-06-17 |
| 8741551 | Method and composition of a dual sensitive resist | Chen-Hau Wu | 2014-06-03 |
| 8741776 | Patterning process for fin-like field effect transistor (finFET) device | Ho Wei De, Ming-Feng Shieh | 2014-06-03 |
| 8715919 | Surface switchable photoresist | Chih-Cheng Chiu | 2014-05-06 |
| 8658344 | Patterning process and photoresist with a photodegradable base | Chien-Wei Wang, Tsai-Sheng Gau, Burn Jeng Lin | 2014-02-25 |
| 8658532 | Method and material for forming a double exposure lithography pattern | — | 2014-02-25 |
| 8609325 | Method of lithography | Fong-Cheng Lee | 2013-12-17 |
| 8597870 | TARC material for immersion watermark reduction | — | 2013-12-03 |
| 8586290 | Patterning process and chemical amplified photoresist composition | Chien-Wei Wang | 2013-11-19 |
| 8564759 | Apparatus and method for immersion lithography | Burn Jeng Lin | 2013-10-22 |
| 8518628 | Surface switchable photoresist | Chih-Cheng Chiu | 2013-08-27 |
| 8512939 | Photoresist stripping technique | Chien-Wei Wang | 2013-08-20 |
| 8507177 | Photoresist materials and photolithography processes | Hsien-Cheng Wang, Chin-Hsiang Lin, Heng-Jen Lee, Hua-Tai Lin, Burn Jeng Lin | 2013-08-13 |
| 8497201 | Self-assembly pattern for semiconductor integrated circuit | Tsung-Lin Lee, Clement Hsingjen Wann | 2013-07-30 |
| 8415091 | Water mark defect prevention for immersion lithography | — | 2013-04-09 |
| 8383322 | Immersion lithography watermark reduction | Vincent Yu | 2013-02-26 |