Issued Patents All Time
Showing 326–350 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8349739 | Conformal etch material and process | — | 2013-01-08 |
| 8323870 | Method and photoresist with zipper mechanism | Fong-Cheng Lee | 2012-12-04 |
| 8304179 | Method for manufacturing a semiconductor device using a modified photosensitive layer | Chien-Wei Wang | 2012-11-06 |
| 8258056 | Method and material for forming a double exposure lithography pattern | — | 2012-09-04 |
| 8253922 | Immersion lithography system using a sealed wafer bath | Bum-Jeng Lin | 2012-08-28 |
| 8222149 | Method for photoresist pattern removal | — | 2012-07-17 |
| 8216767 | Patterning process and chemical amplified photoresist with a photodegradable base | Chien-Wei Wang, Tsai-Sheng Gau, Burn Jeng Lin | 2012-07-10 |
| 8208116 | Immersion lithography system using a sealed wafer bath | Burn Jeng Lin | 2012-06-26 |
| 8202680 | TARC material for immersion watermark reduction | — | 2012-06-19 |
| 8183162 | Method of forming a sacrificial layer | — | 2012-05-22 |
| 8178287 | Photoresist composition and method of forming a resist pattern | — | 2012-05-15 |
| 8163655 | Method for forming a sacrificial sandwich structure | — | 2012-04-24 |
| 8158335 | High etch resistant material for double patterning | Hsiao-Wei Yeh, Jian-Hong Chen, Chih-An Lin | 2012-04-17 |
| 8153350 | Method and material for forming high etch resistant double exposure patterns | Chin-Hsiang Lin | 2012-04-10 |
| 8153523 | Method of etching a layer of a semiconductor device using an etchant layer | Ryan Chia-Jen Chen, Yi-Hsing Chen | 2012-04-10 |
| 8137895 | Structure and method for improving photoresist pattern adhesion | — | 2012-03-20 |
| 8125611 | Apparatus and method for immersion lithography | Tsai-Sheng Gau, Burn Jeng Lin | 2012-02-28 |
| 8105954 | System and method of vapor deposition | Chien-Wei Wang, David Lu | 2012-01-31 |
| 8101340 | Method of inhibiting photoresist pattern collapse | Heng-Jen Lee, Chin-Hsiang Lin, Hua-Tai Lin, Kuei-Shun Chen, Bang-Chein Ho +4 more | 2012-01-24 |
| 8048795 | Self-assembly pattern for semiconductor integrated circuit | Tsung-Lin Lee, Clement Hsingjen Wann | 2011-11-01 |
| 8046860 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Chi-Lun Lu, Shih-Ming Chang, Wen-Chuan Wang +2 more | 2011-11-01 |
| 7993808 | TARC material for immersion watermark reduction | — | 2011-08-09 |
| 7986395 | Immersion lithography apparatus and methods | Burn Jeng Lin, Chin-Hsiang Lin | 2011-07-26 |
| 7972761 | Photoresist materials and photolithography process | Hsien-Cheng Wang, Chin-Hsiang Lin, H. J. Lee, Hua-Tai Lin, Burn Jeng Lin | 2011-07-05 |
| 7927779 | Water mark defect prevention for immersion lithography | — | 2011-04-19 |